Ferroelectric Dielectrics Integrated on Silicon

Discover the cutting-edge advancements in the realm of microelectronics with Ferroelectric Dielectrics Integrated on Silicon by Emmanuel Defay. Published in 2011 by ISTE Ltd and John Wiley & Sons Inc, this comprehensive hardback spans 448 pages, delving into the latest technologies surrounding high-K materials specifically designed for More Than Moore applications.

This insightful book not only covers the fundamental thermodynamic theories related to high-K dielectric thin films but also explores the unique characteristics and extrinsic effects of these materials. Perfect for researchers and professionals in the field, Defay's work offers a detailed examination of ferroelectric thin films and their integration into silicon technology, paving the way for innovative solutions in electric batteries and beyond.

Enhance your understanding of electric properties and the future of microsystems with this essential resource.