Plasma Charging Damage

Discover the groundbreaking insights in Plasma Charging Damage by Kin P. Cheung, published by Springer London Ltd. This comprehensive paperback edition, a softcover reprint of the original 1st edition from 2001, spans an impressive 346 pages and delves into the critical role of plasma in silicon integrated circuit (IC) technology. Over the past 50 years, the advancements in this field have been remarkable, with plasma being utilized in more than 20 key steps of the state-of-the-art silicon IC manufacturing process. This book is an essential resource for professionals and students in electronics and engineering, providing detailed analysis and insights into the impact of plasma charging on optical materials and surfaces. Enhance your understanding of this vital aspect of modern technology with Plasma Charging Damage, a must-read for anyone involved in the machinery and electronics sectors.